Address
Dep. of Semiconductor Engineering, POSTECH 77,
Cheongam-ro, Nam-Gu, Pohang, Gyeongbuk-Do, Korea
(37673)
TEL: +82-54-279-7085
E-mail: daehwankang@postech.ac.kr
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Copyright ⓒ 2023. Chalcogenide Semiconductor Lab (CSL)
All rights reserved | Designed by greypixel
Address
Dep. of Semiconductor Engineering, POSTECH 77, Cheongam-ro, Nam-Gu, Pohang, Gyeongbuk-Do, Korea (37673)
TEL: +82-54-279-7085
E-mail: daehwankang@postech.ac.kr
Copyright ⓒ 2023. Chalcogenide Semiconductor Lab (CSL) All rights reserved | Designed by greypixel
D. K. Lee, D. H. Kang, H. Y. Lee, and J. J. Lee “Properties of carbon nitride films produced by an inductively coupled plasma chemical vapor deposition” Surf. Coating and Technology, vol. 188 – 189, p. 440 (2004).