Address
Dep. of Semiconductor Engineering, POSTECH 77,
Cheongam-ro, Nam-Gu, Pohang, Gyeongbuk-Do, Korea
(37673)
TEL: +82-54-279-7085
E-mail: daehwankang@postech.ac.kr
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Copyright ⓒ 2023. Chalcogenide Semiconductor Lab (CSL)
All rights reserved | Designed by greypixel
Address
Dep. of Semiconductor Engineering, POSTECH 77, Cheongam-ro, Nam-Gu, Pohang, Gyeongbuk-Do, Korea (37673)
TEL: +82-54-279-7085
E-mail: daehwankang@postech.ac.kr
Copyright ⓒ 2023. Chalcogenide Semiconductor Lab (CSL) All rights reserved | Designed by greypixel
Hyun-Mi Kim, Sung-Soo Yim, Ki-Bum Kim, Seung-Hyun Moon, Dae-Hwan Kang, Young-Woon Kim, and Ho-Nyum Lee, “Growth Kinetics of MgB2 Layer and Interfacial MgO Layer During ex situ Annealing of Amorphous Boron Film”, J. Mater. Res. vol. 19, no. 10, p. 3081 (2004).
https://link.springer.com/article/10.1557/JMR.2004.0383