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“Plasma-enhanced atomic layer deposition of TaCx films using tris(neopentyl) tantalum dichloride and H2 plasma”

2023-08-24
조회수 171

Tae-Ho Kim, Tae-Kwang Eom, Soo-Hyun Kim, Dae-Hwan Kang, Hoon Kim, Sangho Yu, and Jin Mook Lim “Plasma-enhanced atomic layer deposition of TaCx films using tris(neopentyl) tantalum dichloride and H2 plasma” Electrochemical and Solid-State Letters, 14 (8) D89-D93 (2011).


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Dep. of Semiconductor Engineering, POSTECH 77,

Cheongam-ro, Nam-Gu, Pohang, Gyeongbuk-Do, Korea

(37673)


TEL: +82-54-279-7085

E-mail: daehwankang@postech.ac.kr



Copyright ⓒ 2023. Chalcogenide Semiconductor Lab (CSL)

All rights reserved | Designed by greypixel


Address

Dep. of Semiconductor Engineering, POSTECH 77, Cheongam-ro, Nam-Gu, Pohang, Gyeongbuk-Do, Korea (37673)


TEL: +82-54-279-7085

E-mail: daehwankang@postech.ac.kr


Copyright ⓒ 2023. Chalcogenide Semiconductor Lab (CSL) All rights reserved | Designed by greypixel