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"Post-implantation annealing effects of Al-implanted p-type junction on specific contact resistance and temperature coefficient of resistance in 4H-SiC MOSFETs"

2025-06-23
조회수 4354

Kyeong-Keun Choi, Seongjeen Kim, Sung-kyu Kim, Senongjun Kim, Young Jae Park, Dae-Hwan Kang "Post-implantation annealing effects of Al-implanted p-type junction on specific contact resistance and temperature coefficient of resistance in 4H-SiC metal‐oxide‐semiconductor field effect transistors." Materials Science in Semiconductor Processing 198 (2025): 109790.

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Address

Dep. of Semiconductor Engineering, POSTECH 77,

Cheongam-ro, Nam-Gu, Pohang, Gyeongbuk-Do, Korea

(37673)


TEL: +82-54-279-7085

E-mail: daehwankang@postech.ac.kr



Copyright ⓒ 2023. Chalcogenide Semiconductor Lab (CSL)

All rights reserved | Designed by greypixel


Address

Dep. of Semiconductor Engineering, POSTECH 77, Cheongam-ro, Nam-Gu, Pohang, Gyeongbuk-Do, Korea (37673)


TEL: +82-54-279-7085

E-mail: daehwankang@postech.ac.kr


Copyright ⓒ 2023. Chalcogenide Semiconductor Lab (CSL) All rights reserved | Designed by greypixel